Plasma characteristics of monocrystalline silicon induced by long pulse laser

GUO Ming1a,1b,ZHANG Yong-xiang

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Journal of Shenyang University of Technology ›› 2020, Vol. 42 ›› Issue (4) : 423-426. DOI: 10.7688/j.issn.1000-1646.2020.04.12

Plasma characteristics of monocrystalline silicon induced by long pulse laser

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2020, 42(4): 423-426 https://doi.org/10.7688/j.issn.1000-1646.2020.04.12

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